Palavra-chave: SILICON NITRIDE

ECR-CVD HETEROSTRUCTURE TRANSISTORS ETCHING SENSOR RAMAN MICROFABRICATION ELECTRON CYCLOTRON RESONANCE PLASMA MEMS MICROMACHINING FILMES FINOS SILICON MICRO RING MIS DEVICES SILICON OXYNITRIDE RESONATORS FABRICATION SILICON DIOXIDE MECHANICAL ALLOYING PLASMA ECR CHEMICAL VAPOR DEPOSITION POWDER METALLURGY ALUMINIUM MATRIX COMPOSITES OPTICAL PROPERTIES MICRO RING RESONATORS RING RESONATOR SELECTIVITY FIELD OXIDATION PASSIVATION ALUMINIUM NITRIDE PLASMA ETCHING FABRICATION PROCESS ISOTROPIC