Palavra-chave: PASSIVATION

INP SILICON DIOXIDE ICP PLASMA ELECTRON CYCLOTRON RESONANCE PLASMA SCHOTTKY CONTACTS MIS DEVICES HETEROSTRUCTURE TRANSISTORS SILICON CARBIDE MOS DEVICES CHEMICAL VAPOR DEPOSITION SILICON NITRIDE TITANIUM OXIDE III-V COMPOUND SEMICONDUCTORS AL2O3 SOLAR CELLS FILMES FINOS NITRETO DE SILÍCIO, DEPOSIÇÃO POR PLASMA CARBETO DE SI - SIC CORONA