Palavra-chave: SILICON

MICROFABRICATION XPD MICROCHIP SI DISLOCATION PLASMA ETCHING PRE-CONCENTRATION INP RTP ATOMIC FORCE MICROSCOPY NANOELECTRONICS PLASMA NANOPILLARS SCALING IRIDA INSTRUMENTATION MIS OXYNITRIDE FILMS MOS SELECTIVITY EXTENDED DEFECTS SINW TIN MOCVD GROWTH LEED PALLADIUM ECR-CVD DOPING DFT ELECTROLESS METAL-DEPOSITION SILICON DIOXIDE LAB ON A CHIP NANOWIRE LED SILICON NITRIDE