Palavra-chave: SILICON

MIS ECR-CVD ELECTROLESS METAL-DEPOSITION MICROCHIP SINW INP IRIDA XPD LED MICROFABRICATION NANOPILLARS DOPING NANOWIRE PRE-CONCENTRATION RTP TIN SILICON NITRIDE MOCVD GROWTH SILICON DIOXIDE PLASMA PALLADIUM SI DISLOCATION MOS SCALING LEED ATOMIC FORCE MICROSCOPY SELECTIVITY INSTRUMENTATION DFT OXYNITRIDE FILMS NANOELECTRONICS PLASMA ETCHING EXTENDED DEFECTS LAB ON A CHIP