Palavra-chave: SILICON DIOXIDE

III-V COMPOUND SEMICONDUCTORS SWINE ION IMPLANTATION SELECTIVITY PLASMA OXIDATION MINIATURE ELECTRICAL RESISTIVITY MOLECULAR STRUCTURE DISPOSITIVOS MOS REFRACTIVE INDEX ION IMPLATANTION RTP ELECTRON CYCLOTRON RESONANCE PLASMA FABRICATION PROCESS ALUMINUM OXYNITRIDE CHEMICAL VAPOR DEPOSITION CORONA PLASMA ETCHING OSSEOINTEGRATION SOLAR CELLS OXIDAÇÃO POR PLASMA SILICON PASSIVATION DIELECTRIC CONSTANT TITANIUM MOS DEVICES CMOS DEVICES SILICON NITRIDE FILMES FINOS SILICON OXYNITRIDE