Palavra-chave: PLASMA ETCHING

MICROFABRICATION FABRICATION PROCESS CORROSÃO POR PLASMA ANISOTROPIA A-SIC H CORROSAO SECA MICROELETRONICA DAMAGE SILICON CARBIDE ION IRRADIATION OPTICAL GAP SCANNING ELECTRON MICROSCOPY GLOW DISCHARGE EXPERIMENTOS PROJETADOS AUGER ELETRON ESPECTROSCOPIA SILICON SELECTIVITY GAS-EVOLVING ELECTRODE ECR ACTINOMETRY FIELD OXIDATION INDUCTIVELY COUPLED PLASMA TUNGSTÊNIO PLASMA POLYMER AUGER ELECTRON SPECTROSCOPY ELECTRICAL CONDUCTIVITY ISOTROPIC SILICON DIOXIDE HYDROGEN EVOLUTION ISOTROPIA ETCHING ANISOTROPIC ETCHING , MICROMACHINING APPLICATION A-SIHA - SI IN-BASED COMPOUND SEMICONDUCTORS DIELÉTRICOS ETCHING OF TUNGSTEN SILICON NITRIDE TRANSPORT MODEL MOLECULAR STRUCTURE