Palavra-chave: ELECTRON CYCLOTRON RESONANCE PLASMA

CHEMICAL VAPOR DEPOSITION SILICON NITRIDE POLYCRYSTALLINE SIGE MOS DEVICES SILICON OXYNITRIDE SILICON DIOXIDE III-V COMPOUND SEMICONDUCTORS HETEROSTRUCTURE TRANSISTORS OPTICAL EMISSION SPECTROSCOPY FILMES FINOS PASSIVATION AMORPHOUS SILICON MEMORIA AMOPHOUS SILICON RAMAN SPECTROSCOPY LASER REFLECTOMETRY ETCHING SCHOTTKY CONTACTS MICROMACHINING MIS DEVICES DISPOSITIVOS MOS PLASMA OXIDATION MICROFABRICATION MEMS HIGH K DIELECTRICS DIELECTRIC CONSTANT ALUMINUM OXYNITRIDE OXINITRETO DE SILÍCIO NITRETO DE SILÍCIO, DEPOSIÇÃO POR PLASMA