Palavra-chave: ELECTRON CYCLOTRON RESONANCE PLASMA

SILICON NITRIDE CHEMICAL VAPOR DEPOSITION MOS DEVICES POLYCRYSTALLINE SIGE SILICON OXYNITRIDE SILICON DIOXIDE HETEROSTRUCTURE TRANSISTORS III-V COMPOUND SEMICONDUCTORS FILMES FINOS OPTICAL EMISSION SPECTROSCOPY PASSIVATION AMORPHOUS SILICON MEMORIA AMOPHOUS SILICON RAMAN SPECTROSCOPY LASER REFLECTOMETRY ETCHING SCHOTTKY CONTACTS MICROMACHINING MIS DEVICES DISPOSITIVOS MOS PLASMA OXIDATION MICROFABRICATION MEMS HIGH K DIELECTRICS OXINITRETO DE SILÍCIO DIELECTRIC CONSTANT ALUMINUM OXYNITRIDE NITRETO DE SILÍCIO, DEPOSIÇÃO POR PLASMA